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OVIs by Dynamic Headspace and Gerstel MACH on Rtx-624 (G43) and Rtx-WAX (G16)

OVIs by Dynamic Headspace and Gerstel MACH on Rtx-624 (G43) and Rtx-WAX (G16)

Peaks
1.Methanol
2.Acetonitrile
3.Dichloromethane
4.trans-1,2-Dichloroethylene
5.Hexane
6.cis-1,2-Dichloroethylene
7.Nitromethane
8.Tetrahydrofuran
9.Chloroform
10.Cyclohexane
11.1,2-Dimethoxyethane
Peaks
12.Trichloroethylene
13.Methylcyclohexane
14.1,4-Dioxane
15.Pyridine
16.Toluene
17.2-Hexanone
18.Chlorobenzene
19.Ethyl benzene
20.m-Xylene
21.p-Xylene
22.o-Xylene
23.Tetralin
* septum components
image
GC_PH00845
ColumnsRtx-624 20 m, 0.18 mm ID, 1.00 µm (cat.# 40924)
and Rtx-WAX (G16) 20m, 0.18mm ID, 0.4µm (custom)
using IP Deactivated Guard Column 5 m, 0.32 mm ID (cat.# 10044)
with Universal “Y” Press-Tight Connector (cat.# 20405)
SampleResidual Solvents Class 2 - Mix A (cat.# 36271)
Residual Solvents Class 2 - Mix B (cat.# 36272)
Diluent:0.5mL DI water/~0.2g sodium sulfate in 20mL headspace vial; components at 0.10 - 6.00µg
Injectionheadspace-trap split (split ratio 20:1)
Headspace-Trap
Instrument:Tekmar HT3
Inj. Temp.:220 °C
Transfer Line Temp.:220 °C
Valve Oven Temp.:220 °C
Standby flow rate:50 mL/min
Trap Standby Temp:40 °C
Trap Sweep Temp:40 °C
Preheat Mixer:On
Preheat Mixer Time:2.0 min
Preheat Mixing Level:5
Preheat Mixer Stabilize Time:0.5 min
Sample Temp.:80 °C
Sweep Flow Rate:75 mL/min
Sweep Flow Time:5.0 min
Dry Purge: 10.0 min, flow 100 mL/min @ 25 °C
Desorb Preheat Temp:245 °C
Desorb: 1.0 min @ 250 °C
Trap Bake Temp:260 °C
Trap Bake Time:6.0 min
Trap Bake Flow:450 mL/min
Oven
Oven Temp.:250 °C
Carrier GasHe
DetectorFID @ 250 °C
Make-up Gas Flow Rate:45 mL/min
InstrumentAgilent 6890 with Gerstel Modular Accelerated Column Heater (MACH)
NotesSample preheat time: 15.00 min.

Flow rate: Constant Flow, Column 1: 0.85mL/min.; Column 2: 0.99mL/min.

Gerstel temps.:

Column 1: 50°C (2 min.) to 80°C at 20°C/min. (1 min.), to 200°C at 40°C/min. (2 min.)
Column 2: 35°C (2 min.) to 60°C at 100°C/min. (1 min.), to 200°C at 40°C/min. (2 min.)
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