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Peak Shape Comparison of Early Eluting Semivolatiles Using Split (10:1) and Splitless Injection at 80 °C Oven Start Temp.

ColumnRxi-5Sil MS, 30 m, 0.25 mm ID, 0.25 µm (cat.# 13623)
Sample8270 MegaMix (cat.# 31850)
Benzoic acid (cat.# 31879)
8270 Benzidines Mix (cat.# 31852)
Acid Surrogate Mix (4/89 SOW) (cat.# 31025)
1,4-dioxane (cat.# 31853)
Revised B/N Surrogate Mix (cat.# 31887)
SV Internal Standard Mix (cat.# 31206)
Diluent:Methylene chloride
Conc.:40 µg/mL
Injectionsplitless
Inj. Temp.:270 °C
Oven
Oven Temp.:80 °C (hold 1 min) to 320 °C at 25 °C/min to 330 °C at 5 °C/min (hold 2 min)
Carrier GasHe, constant flow
Flow Rate:1.2 mL/min
DetectorMS
Mode:Scan
Transfer Line Temp.:280 °C
Analyzer Type:Quadrupole
Source Temp.:250 °C
Quad Temp.:150 °C
Tune Type:DFTPP
Ionization Mode:EI
Scan Range:35-550 amu
InstrumentAgilent 7890A GC & 5975C MSD
NotesSplit: 1 μL split (10:1)
Splitless: 1 μL splitless (0.5 min.)