Before you go to NACRW 2016, visit our NACRW 2016 page to learn what we’ll be doing, to easily contact us with any questions you may have, and to access the meeting’s website for additional event details.
Did you have the chance to take in any of our technical posters or enjoy the Restek vendor seminar at NACRW 2013? There was so much to do — so much it was simply impossible to see everything — so we wanted to let you know that we’ve posted our presentations on our NACRW website: www.restek.com/nacrw Review them at your leisure, and feel free to get in touch with the authors directly to discuss them further.
Restek would also like to take this opportunity to congratulate our own Dr. Julie Kowalski for being elected as the 2015 NACRW president! She has been an active member of the organizing committee for the Florida Pesticide Residue Workshop (FPRW)—now known as the North American Chemical Residue Workshop (NACRW)—and was instrumental in setting up the meeting’s first-ever social event: the Dali Museum visit. Having just finished its 50th year, NACRW has earned wide acclaim in the industry, and we look forward to seeing Julie at its helm in 2015.
Author(s): Jack Cochran
Published By: Restek Corporation
Year of Publication: 2011
Abstract: Restek’s Jack Cochran sat down for an interview with chromatography icon M. George Fong. They discussed George’s founding of FPRW in the 1960s, FPRW’s growth from a small intra-lab meeting into an international event, George’s involvement in the history and future of pesticide residue analysis, and more.